Question: An appeal for help from a beginner (but a happy one) 

Forum: SU-8 Photoresist Discussion Forum
Date: 2004, May 04
From: Jim <J.R.D.Blanche@hw.ac.uk>

Hi Everyone, I'm a new guy to MEMS fabrication (only just started an MPhil on the subject). I was hoping you all wouldn't mind if i asked a few questions over time to aid progress?:-) My first question is this: What, in all varied opinions, is the most effective way to treat a glass/titanium wafer prior to the application of the SU-8 resist? I'm currently spinning the wafer in a brief jet of acetone(AR) and baking for about 3 mins (65 degC)to try and get rid of moisture. I've tried increasing my anti-moisture bake time and still get many imperfections/bubbles in my eventual SU-8 film. hmmmmmmm Any thoughts or suggestions? Many thanks from the new guy :-) Jim

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