HI all, I have a problem regarding the flatness of SU8 during softbake.
I try to softbake the photoresist(SU8-2025, about 30 micron thick)
following the specs given in MicroChem data sheet(3min 65C & 9min 95C).
However when placed on hotplate at 95C,
Islands formed on the resist, making it extremely uneven. Even when the resist has cooled down, the Islands still remains.
Can anyone provide recommended condition for the softbaking.