I have a problem using SU-8. I use a mask in which there is a 10micron wide channel. I follow the normal steps of using SU-8, but after I developed the substrate, the photoresist on the substrate is about 200 micron wide!! I tried several UV exposure times, but the results were almost the same, 200-300 micron wide. The more funny is the photoresist on the substrate was bifurcated... Did someone meet such problem before? Any suggestion or advice?