Width Control 

Forum: SU-8 Photoresist Discussion Forum
Date: 2004, Sep 15
From: Gene <empyreankqj@yahoo.com.cn>

Hi everyone, I have a problem using SU-8. I use a mask in which there is a 10micron wide channel. I follow the normal steps of using SU-8, but after I developed the substrate, the photoresist on the substrate is about 200 micron wide!! I tried several UV exposure times, but the results were almost the same, 200-300 micron wide. The more funny is the photoresist on the substrate was bifurcated... Did someone meet such problem before? Any suggestion or advice? Thanks a lot!! Gene

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