SU-8 problems 

Forum: SU-8 Photoresist Discussion Forum
Date: 2006, May 23
From: Kelkar <rkelkar@purdue.edu>

Hi Everybody, I'm a research assistant conducting an experiment where we utilize the SU-8 photoresist. The problem I'm facing is to do with the adhesion of the exposed SU-8 structure to the glass after developing. It seems that everytime I try to develop the SU-8 after exposure, the structures on it always wash away! Any tips on solving this problem? This is the procedure I use for preparation and exposure: 1.) Cleaning of glass with DI water and Methanol 2.) Nitrogen blast to remove particles and fluid 3.) Heat to 200 deg C to dry the glass surface 4.) Spin coating of glass with SU-8 at 2000rpm 5.) Soft bake to 95 deg C 6.) Exposure 7.) PEB 8.) Develop using NanoTech developer and ISA Also, can anyone explain to me what flood exposure is? Thank you very much for your assistance. Kelkar

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1. Satya by Satyanarayan, 2007, Apr 03

to: "SU-8 problems"