I'm a research assistant conducting an experiment where we utilize the SU-8 photoresist. The problem I'm facing is to do with the adhesion of the exposed SU-8 structure to the glass after developing. It seems that everytime I try to develop the SU-8 after exposure, the structures on it always wash away! Any tips on solving this problem?
This is the procedure I use for preparation and exposure:
1.) Cleaning of glass with DI water and Methanol
2.) Nitrogen blast to remove particles and fluid
3.) Heat to 200 deg C to dry the glass surface
4.) Spin coating of glass with SU-8 at 2000rpm
5.) Soft bake to 95 deg C
8.) Develop using NanoTech developer and ISA
Also, can anyone explain to me what flood exposure is?